Raith, the global leading manufacturer of nanofabrication instrumentation, has delivered its VELION system to the Center for Materials and Microsystems of FBK – Fondazione Bruno Kessler in Trento, Italy, a research institute that aims at results of excellence in science and technology with particular emphasis on interdisciplinary approaches and their applicative dimension.
Join us for a symposium on Direct Write, Optical, Ion and Electron Beam Lithography at the University of Stuttgart from February 18-19, 2020. This symposium features technical experts and customers from Heidelberg Instruments, Nanoscribe, micro resist technology, Genysis and Raith who will describe the spectrum of latest, state-of-the-art direct-write capabilities. Don't miss the opportunity to get a broad overview of different aspects of nanolithography and to meet experts in all sorts of nanolithography disciplines and sign up now
Congratulations to this year's winner of the Raith Micrograph Award: Sergey Gorelick from Monash University, Australia, Martin Wolff from University of Münster, Germany and Nadia Ligato from NEST CNR-Nano, Italy. Find out who won an art award and take a closer look at the winner micrographs here
Raith’s PIONEER Two helped to detect “Big Bang molecule” The first astrophysical detection of the helium hydride ion hit the news in April, immediately generating massive interest. The ion was the first molecule that formed after the Big Bang but could never before be detected in interstellar medium. With GREAT’s (German REceiver for Astronomy at Terahertz frequencies) far-infrared spectrometer onboard the flying observatory SOFIA (Stratospheric Observatory For Infrared Astronomy) detection was now made possible, offering a glance at the history of the early Universe. A central part of the receiver was fabricated with the help of a Raith PIONEER Two system: The NbN Hot-Electron-Bolometers used to down-convert the incoming THz signals to amplifiable GHz frequencies were designed and patterned at the microfabrication laboratory of University of Cologne’s I. Physikalisches Institut.
Learn how a standard adhesive tape can help overcome the relatively slow patterning speed of direct FIB milling. Our new application note describes the sketch & peel approach in detail and also investigates the change in outcome when using different ion species. Download it here:
