Advanced Fabrication from Meso to Nano is the topic of the Joint Symposium of Heidelberg Instruments, Nanoscribe, SwissLitho, Zeiss, Alvéole and Raith at Stanford University.
Sign up for Raith User Dinner and Raith Users Technical Session
Meet us on the EIPBN in Puerto Rico and interact with like-minded professionals during our Users Dinner and the Raith Users Technical Session. Sign up for both events here
Congratulations to our customer Prof. Andrei Faraon from Caltech for his achievements in MEMS-integrated metasurfaces!
A recently published article in Nature Communications demonstrates the work of his group which paves the way towards MEMS-integrated metasurfaces as a platform for tunable and reconfigurable optics.
Our new application note by A. Han et al. from DTU (Technical University of Denmark) explains the advantages of negative-tone direct-write Organic Ice Resist processes which eliminate the solvent development and drying required for EBL, thus allowing for further sample processing either in situ or ex situ.
