Learn how a standard adhesive tape can help overcome the relatively slow patterning speed of direct FIB milling. Our new application note describes the sketch & peel approach in detail and also investigates the change in outcome when using different ion species. Download it here:
Congratulations to this year's winner of the Raith Micrograph Award: Christiaan Bekker (University of Queensland, Australia), Sedighe Salimian (NEST, Italy), Denver Linklater (Swinburne University of Technology, Australia) and Xiaoyang Duan (Heidelberg University, Germany). Find out who won an art award and take a closer look at the winner micrographs here
We are excited to meet you on the MRS Fall Meeting in Boston. Sign up for one of our Lunch & Learn sessions and discover our new VELION FIB-SEM! Furthermore don't miss your chance to win a stylish "I ♥ Nano" T-shirt. Find out all the details here:
Advanced Fabrication from Meso to Nano is the topic of the Joint Symposium of Heidelberg Instruments, Nanoscribe, SwissLitho, Zeiss, Alvéole and Raith at Stanford University.
